Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California / Jim Dey, editor ; cooperating organization, Northern California Microphotomask/Masking Working Group.

Format
Book
Language
English
Published/​Created
Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, c1979.
Description
vi, 194 p. : ill. ; 28 cm.

Details

Subject(s)
Related name
Series
  • Society of Photo optical Instrumentation Engineers. Proceedings ; [More in this series]
  • Proceedings of the Society of Photo-optical Instrumentation Engineers ; v. 174
Notes
Proceedings of a seminar.
Bibliographic references
Includes bibliographical references and indexes.
ISBN
089252202X
LCCN
80105579
OCLC
6144988
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