<oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd"><dc:title>Testing for small-delay defects in nanoscale CMOS integrated circuits</dc:title><dc:creator>Goel, Sandeep K.</dc:creator><dc:creator>Chakrabarty, Krishnendu</dc:creator><dc:language>English</dc:language><dc:format>Book</dc:format><dc:description>Advances in design methods and process technologies have resulted in a continuous increase in the complexity of integrated circuits (ICs). However, the increased complexity and nanometer-size features of modern ICs make them susceptible to manufacturing defects, as well as performance and quality issues. Testing for Small-Delay Defects in Nanoscale CMOS Integrated Circuits covers common problems in areas such as process variations, power supply noise, crosstalk, resistive opens/bridges, and design-for-manufacturing (DfM)-related rule violations. The book also addresses testing</dc:description><dc:date>2014</dc:date><dc:publisher>Boca Raton : CRC Press, 2014.</dc:publisher><dc:subject>Metal oxide semiconductors, Complementary—Testing</dc:subject><dc:type>Book</dc:type><dc:identifier>9781315217819</dc:identifier><dc:identifier>9781439829417</dc:identifier></oai_dc:dc>