Advanced etch technology for nanopatterning VII : 26-28 February 2018, San Jose, California, United States / Sebastian U. Engelmann, Richard S. Wise, editors ; sponsored by SPIE.

Author
Advanced Etch Technology for Nanopatterning (Conference) (7th : 2018 : San Jose, Calif.) [Browse]
Format
Book
Language
English
Published/​Created
Bellingham, Washington : SPIE, 2018.
Description
1 online resource (105 pages).

Details

Subject(s)
Editor
Sponsoring body
Series
  • Proceedings of SPIE--the International Society for Optical Engineering ; Volume 10589. [More in this series]
  • Proceedings of SPIE ; Volume 10589
Source of description
Description based on: online resource; title from pdf title page (SPIE Digital Library, viewed October 29, 2018).
ISBN
1-5106-1671-3
Statement on language in description
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